Apparatus for vaporizing and supplying organometal compounds

Details Apparatus for vaporizing and supplying organometal compounds Apparatus for vaporizing and supplying organometal compounds

1990-09-11

1992-11-03

Beck, Shrive

Coating apparatus

Gas or vapor deposition

118724, 118726, 156611, 4272481, 4272552, C23C 1600

Patent

active

051605422

ABSTRACT:
An apparatus for vaporizing and supplying an organometal compound comprising a gas flow path for starting gas which connects a container filled with the organometal compound to a crystal growth chamber heated under reduced pressure through a main valve, a massflow controller for the starting gas and a valve for supplying the starting gas; and a flow path for a carrier gas which connects a carrier gas source to the discharge outlet of the valve for supplying the starting gas through a massflow controller for carrier gas and a heat exchanger. The container, the flow path for the starting gas and the flow path for the carrier gas are arranged in a constant temperature oven.

REFERENCES:
patent: 4051382 (1977-08-01), Ogawa et al.
patent: 4066481 (1978-01-01), Manasevit et al.
patent: 4844006 (1989-07-01), Page, Jr. et al.
patent: 4904337 (1990-02-01), Elliott et al.
patent: 4950621 (1990-08-01), Irvine et al.

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