4. Semiconductor device manufacturing: process
  5. Making field effect device having pair of active regions...
  6. On insulating substrate or layer

Scott Crowder

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Fully amorphized source/drain for leaky junctions

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
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Method for self-aligned vertical double-gate MOSFET

Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – On insulating substrate or layer
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Vapor phase etch trim structure with top etch blocking layer

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
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Profile ID: LFUS-PAI-P-2443931

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