4. Coating apparatus
  5. Gas or vapor deposition
  6. With treating means

Scott Beherrell

Inventor

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CVD reactor for uniform heating with radiant heating filaments

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Induction heated chemical vapor deposition reactor

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state – With decomposition of a precursor
Reexamination Certificate

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Wafer carrier with flexible wafer flat holder

Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure
Patent

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Profile ID: LFUS-PAI-P-1475288

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