Wafer carrier with flexible wafer flat holder

Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure

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C23C 1600

Patent

active

058401245

ABSTRACT:
Apparatus for mounting wafers in an epitaxial reactor is disclosed. The apparatus includes a wafer carrier for holding the wafer during the epitaxial deposition, including a depressed region for the wafer, and a positioning wire located in the depressed region to maintain the position of the wafer without interfering with the epitaxial deposition process itself.

REFERENCES:
patent: 4182265 (1980-01-01), Bracher
patent: 4971676 (1990-11-01), Doue et al.
patent: 5207324 (1993-05-01), Kos
patent: 5391231 (1995-02-01), Schertler
patent: 5494524 (1996-02-01), Inaba et al.
patent: 5683518 (1997-11-01), Moore

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