Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure
Patent
1997-06-30
1998-11-24
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Crucible or evaporator structure
C23C 1600
Patent
active
058401245
ABSTRACT:
Apparatus for mounting wafers in an epitaxial reactor is disclosed. The apparatus includes a wafer carrier for holding the wafer during the epitaxial deposition, including a depressed region for the wafer, and a positioning wire located in the depressed region to maintain the position of the wafer without interfering with the epitaxial deposition process itself.
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patent: 5207324 (1993-05-01), Kos
patent: 5391231 (1995-02-01), Schertler
patent: 5494524 (1996-02-01), Inaba et al.
patent: 5683518 (1997-11-01), Moore
Beherrell Scott
Boguslavskiy Vadim
Gurary Alexander I.
Bueker Richard
Emcore Corporation
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