CVD reactor for uniform heating with radiant heating filaments

Details CVD reactor for uniform heating with radiant heating filaments CVD reactor for uniform heating with radiant heating filaments

1997-06-30

1998-06-02

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118730, C23C 1600

Patent

active

057592810

ABSTRACT:
Apparatus for the growth of epitaxial layers is disclosed. The apparatus includes a wafer carrier mounted within a growth chamber, a reactant inlet for introducing a reactant into the chamber, and a heating element mounted within the chamber for heating wafers mounted on the wafer carrier. The heating element is mounted in a manner which permits unrestricted thermal expansion of the heating element therein.

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