4. Coating apparatus
  5. Gas or vapor deposition
  6. With treating means

Sae Takagi

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Method for forming a thin semiconductor film and a plasma CVD ap

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Method for forming a thin semiconductor film and a plasma CVD ap

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Amorphous semiconductor
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Profile ID: LFUS-PAI-P-1209105

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