4. Etching a substrate: processes
  5. Gas phase etching of substrate
  6. Application of energy to the gaseous etchant or to the...

Robert W Wu

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Adjusting DC bias voltage in plasma chambers

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Patent

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Silicon carbide composite article particularly useful for plasma

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Yttrium oxide based surface coating for semiconductor IC...

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Reexamination Certificate

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Profile ID: LFUS-PAI-P-1421279

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