4. Semiconductor device manufacturing: process
  5. Formation of semiconductive active region on any substrate
  6. Fluid growth from gaseous state combined with subsequent...

Robert W. Standley

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Epitaxial silicon wafer free from autodoping and backside...

Metal treatment – Barrier layer stock material – p-n type – With contiguous layer doped to degeneracy
Reexamination Certificate

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Flattening process for epitaxial semiconductor wafers

Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Fluid growth from gaseous state combined with subsequent...
Patent

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Modified susceptor for use in chemical vapor deposition process

Single-crystal – oriented-crystal – and epitaxy growth processes; – Apparatus
Reexamination Certificate

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Modified susceptor for use in chemical vapor deposition process

Single-crystal – oriented-crystal – and epitaxy growth processes; – Apparatus
Reexamination Certificate

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Photoconducting amorphous carbon

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board
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Profile ID: LFUS-PAI-P-902730

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