4. Coating apparatus
  5. Gas or vapor deposition
  6. Crucible or evaporator structure

Ram N Kacker

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Electrostatic chucking stage and substrate processing apparatus

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With workpiece support
Reexamination Certificate

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Method and system for rotating a semiconductor wafer in...

Coating apparatus – Gas or vapor deposition – Work support
Reexamination Certificate

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Supporting device for heating crucible and deposition...

Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2344857

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