4. Etching a substrate: processes
  5. Gas phase etching of substrate
  6. Application of energy to the gaseous etchant or to the...

Paul-Rene Muralt

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Method for improving the rate of a plasma enhanced vacuum treatm

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
Patent

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Method for improving the rate of a plasma enhanced vacuum...

Material or article handling – Associated with semiconductor wafer handling
Reexamination Certificate

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Process for setting a working rate distribution in an etching or

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent

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Vacuum treatment apparatus

Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent

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Profile ID: LFUS-PAI-P-1003106

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