Coating apparatus
Gas or vapor deposition
Multizone chamber
Corporate Assignee
active
No affiliations
Deposition reactor with precursor recycle
Gas-based backside protection during substrate processing
Process for depositing F-doped silica glass in high aspect...
Wafer heating using edge-on illumination
LandOfFree
Novellus Systems does not yet have a rating. At this time, there are no reviews or comments for this inventor.
If you have personal experience with Novellus Systems, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Novellus Systems will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-P-1612523