Deposition reactor with precursor recycle

Details Deposition reactor with precursor recycle Deposition reactor with precursor recycle

2007-05-15

2007-05-15

Bhat, N. (Department: 1764)

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

C427S255260, C427S299000, C427S331000, C427S255190, C438S478000

Reexamination Certificate

active

10329251

ABSTRACT:
A reactor vessel is provided with a solvent in a supercritical PVT state for use in depositing films on a deposition substrate. A metal organic precursor is dissolved in the supercritical solvent, as is a reaction agent. A chemical reaction deposits a film, such as a metal film on a semiconducting wafer, and reaction byproducts including a ligand ensue from the chemical reaction. Effluent from the reactor vessel is submitted to a precursor-forming agent that reacts with the ligand to rejuvenate the precursor. Alternatively, the precursor-forming agent can be used for point-of-use formation of the precursor with or without recycle of reaction byproducts.

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