4. Coating apparatus
  5. Gas or vapor deposition
  6. Work support

Nobusige Korenaga

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Mask holding device, and an exposure apparatus and a device manu

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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Stage apparatus for an exposure apparatus including a contant te

Coating apparatus – Gas or vapor deposition – Work support
Patent

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Velocity sensor and semiconductor exposing apparatus using such

Measuring and testing – Speed – velocity – or acceleration – Acceleration determination utilizing inertial element
Patent

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Profile ID: LFUS-PAI-P-1807222

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