4. Chemistry: electrical and wave energy
  5. Apparatus
  6. Coating, forming or etching by sputtering

Munenori Mashima

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Deposition-preventing part for physical vapor deposition apparat

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent

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Sputtering target and method for manufacturing same

Powder metallurgy processes – Powder metallurgy processes with heating or sintering – Making composite or hollow article
Patent

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Target units

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent

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Profile ID: LFUS-PAI-P-170162

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