Light-exposure apparatus

Photocopying – Projection printing and copying cameras – Distortion introducing or rectifying

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Details

355 53, 355 76, G03B 2768

Patent

active

046662910

ABSTRACT:
A light-exposure apparatus which can keep uniform the gap between a mask and a wafer and reduce the density of arrangement of vertical movers adapted to deform the wafer to thereby reduce cost and weight of the apparatus. The apparatus has a thin plate deforming mechanism comprising a chuck platen for holding on its top surface the wafer, the bottom surface of the chuck platen being formed with imperforate slits patterned in the form of a grid composed of a plurality of triangular meshes so that the chuck platen may be deformed along bending lines near the triangular meshes, and a plurality of vertical movers for vertically deforming the individual triangular meshes so as to flatten or deform into a desired shape the wafer.

REFERENCES:
patent: 4093378 (1978-06-01), Horr et al.
patent: 4239381 (1980-12-01), Lacombat et al.
patent: 4298273 (1981-11-01), Nishizuka et al.
patent: 4315692 (1982-02-01), Heinecke et al.
patent: 4425038 (1984-01-01), LaFiandra et al.
patent: 4537498 (1985-08-01), Banks et al.

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