4. Coating apparatus
  5. Gas or vapor deposition
  6. Multizone chamber

Mitsusuke Kyogoku

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Device and method for load locking for semiconductor processing

Material or article handling – Apparatus for moving material between zones having different... – For carrying standarized mechanical interface type
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Electron beam apparatus with improved specimen holder

Radiant energy – Inspection of solids or liquids by charged particles – Analyte supports
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Heat treatment apparatus

Coating apparatus – Gas or vapor deposition – With treating means
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HF vapor selective etching method and apparatus

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
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Load lock chamber for vertical type heat treatment apparatus

Coating apparatus – Gas or vapor deposition – Multizone chamber
Patent

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Profile ID: LFUS-PAI-P-512785

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