4. Coating processes
  5. Interior of hollow article coating
  6. Coating by vapor, gas, mist, or smoke

Ming-Hwa Yoo

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Method for removing residual fluorine in HDP-CVD chamber

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
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Method of forming in-situ SRO HDP-CVD barrier film

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
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Method to neutralize charge imbalance following a wafer...

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate

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Method to solve IMD-FSG particle and increase Cp yield by...

Coating processes – Coating by vapor – gas – or smoke – Plural coatings applied by vapor – gas – or smoke
Reexamination Certificate

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Method to solve particle performance of FSG layer by using...

Coating processes – Interior of hollow article coating – Coating by vapor – gas – mist – or smoke
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Profile ID: LFUS-PAI-P-2550547

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