4. Semiconductor device manufacturing: process
  5. Chemical etching
  6. Vapor phase etching

Ming-Hsin Huang

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Chemistry for etching organic low-k materials

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Patent

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Hard masking method for forming oxygen containing plasma etchabl

Etching a substrate: processes – Gas phase etching of substrate – Etching inorganic substrate
Patent

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Hard masking method for forming patterned oxygen containing plas

Etching a substrate: processes – Etching of semiconductor material to produce an article...
Patent

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Hard masking method for forming patterned oxygen containing...

Etching a substrate: processes – Etching of semiconductor material to produce an article...
Reissue Patent

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Hard masking method for forming residue free oxygen...

Semiconductor device manufacturing: process – Chemical etching – Combined with coating step
Reexamination Certificate

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Profile ID: LFUS-PAI-P-946009

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