4. X-ray or gamma ray systems or devices
  5. Specific application
  6. Lithography

Micronix Partners

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Alignment apparatus

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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High power x-ray source with improved anode cooling

X-ray or gamma ray systems or devices – Source – Electron tube
Patent

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Lithography system

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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Lithography system

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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Mask alignment apparatus

Gear cutting – milling – or planing – Milling – Work support
Patent

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Profile ID: LFUS-PAI-P-788218

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