Semiconductor device manufacturing: process
Introduction of conductivity modifying dopant into...
Ion implantation of dopant into semiconductor region
Corporate Assignee
active
No affiliations
4 F2 folded bit line dram cell structure having buried bit...
Non-lot based method for assembling integrated circuit devices
Sputtered metal silicide film stress control by grain boundary s
LandOfFree
Micron Tecnology, Inc. does not yet have a rating. At this time, there are no reviews or comments for this inventor.
If you have personal experience with Micron Tecnology, Inc., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Micron Tecnology, Inc. will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-P-512004