4. Coating apparatus
  5. Gas or vapor deposition
  6. With treating means

Michael J. Ries

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Epitaxial silicon wafer free from autodoping and backside...

Metal treatment – Barrier layer stock material – p-n type – With contiguous layer doped to degeneracy
Reexamination Certificate

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Pressure equalization system for chemical vapor deposition react

Coating apparatus – Gas or vapor deposition
Patent

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Secondary edge reflector for horizontal reactor

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Semiconductor wafer holder

Work holders – Relatively movable jaws – Jaw features
Reexamination Certificate

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Profile ID: LFUS-PAI-P-607368

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