4. Coating apparatus
  5. Gas or vapor deposition
  6. With treating means

Masatoshi Onoda

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Apparatus and method for processing substrate

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Plasma generating device

Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate

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Vacuum processing apparatus and method operation thereof

Drying and gas or vapor contact with solids – Process – Gas or vapor pressure is subatmospheric
Reexamination Certificate

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Profile ID: LFUS-PAI-P-1396724

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