Apparatus and method for processing substrate

Details Apparatus and method for processing substrate Apparatus and method for processing substrate

1997-10-28

2000-07-25

Ahmad, Nasser

Coating apparatus

Gas or vapor deposition

With treating means

118723FI, 156345P, 156345PC, 156345WH, 20429825, 20429828, B65G 4907, H01L 2168

Patent

active

060924853

ABSTRACT:
A substrate processing apparatus includes a processing chamber and a vacuum spare chamber adjacent thereto through a vacuum valve. The processing chamber houses two holders for holding substrates on their surfaces on the same side. The processing chamber is provided with an ion source for irradiating the substrate on each holder having reached a processing position P with an ion beam so that it is subjected to ion implantation. The processing chamber is internally provided with a holder moving mechanism for performing the operation of moving the two holders in parallel independently from each other so that they traverse the processing position P, and moving the two holders in parallel simultaneously between the insides of the processing chamber and vacuum spare chamber through the vacuum valve. The vacuum spare chamber is internally provided with a substrate replacing mechanism for replacing processed substrates and non-processed substrates with each other collectively for the two holders in cooperation with the holder moving mechanism.

REFERENCES:
patent: 3717119 (1973-02-01), Boys
patent: 4816638 (1989-03-01), Ukai et al.

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