Vacuum processing apparatus and method operation thereof

Details Vacuum processing apparatus and method operation thereof Vacuum processing apparatus and method operation thereof

2008-05-06

2008-05-06

Lu, Jiping (Department: 3749)

Drying and gas or vapor contact with solids

Process

Gas or vapor pressure is subatmospheric

C034S417000, C034S092000, C034S209000, C034S242000, C414S939000

Reexamination Certificate

active

07367139

ABSTRACT:
This vacuum processing apparatus has a fixed processing chamber24and two movable load lock chambers28aand28b. A gate valve26is provided on the processing chamber24,and gate valves30are respectively provided on the load lock chambers28aand28b. Each of the load lock chambers28aand28bis moved in a Y direction by a preparatory chamber moving mechanism34.A vacuum seal54,which is expandable and shrinkable so as to vacuum seal a gap G between the gate valves26and30which are set close to each other during the expansion, is provided around a peripheral edge portion of the processing chamber gate valve26.Further, a substrate transporting mechanism for transporting a substrate2between the processing chamber24and each of the load lock chambers28aand28bset close thereto.

REFERENCES:
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patent: 6142773 (2000-11-01), Shimazu
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patent: WO-03/005413 (2003-01-01), None
Korean Office Action dated Jul. 20, 2007, for Patent Application No. 10-2006-0055381.

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