4. Chemistry: electrical and wave energy
  5. Processes and products
  6. Coating, forming or etching by sputtering

Mark Weise

Inventor

Rate now
  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Inventor

active

Method of high density plasma CVD gap-filling

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Process for depositing a SiO.sub.x film having reduced intrinsic

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Process for depositing a SiOx film having reduced intrinsic...

Coating processes – Direct application of electrical – magnetic – wave – or... – Plasma
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Mark Weise does not yet have a rating. At this time, there are no reviews or comments for this inventor.

If you have personal experience with Mark Weise, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mark Weise will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-P-805803

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.

Canada

 Charities
 Companies
 MP Candidates
 Patents
 Employee Salary Disclosure

World

 Places of the World
 Scientific Papers

United States

 Banks
 Companies
 Counties
 Patents
 Employee Salary Disclosure