4. Coating apparatus
  5. Gas or vapor deposition
  6. Work support

Manus Wong

Inventor

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Multi-zone RF inductively coupled source configuration

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent

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Substrate support with pressure zones having reduced contact are

Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field
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Symmetric tunable inductively coupled HDP-CVD reactor

Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate

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Welded susceptor assembly

Coating apparatus – Gas or vapor deposition – Work support
Patent

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Profile ID: LFUS-PAI-P-602286

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