4. Semiconductor device manufacturing: process
  5. Introduction of conductivity modifying dopant into...
  6. Ion implantation of dopant into semiconductor region

Lancy Y. Tsung

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Chemical etch solution and technique for imaging a device's...

Radiant energy – Inspection of solids or liquids by charged particles – Methods
Reexamination Certificate

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Method to reduce source-line resistance in flash memory with...

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2151975

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