Metal treatment
Stock
Vanadium, niobum, or tantalum base
Inventor
active
Iron silicide powder and method for production thereof
Iron silicide sputtering target and method for production...
Silicide target for depositing less embrittling gate oxide...
Tantalum or tungsten target-copper alloy backing plate...
Tantalum sputtering target
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Profile ID: LFUS-PAI-P-2188470