Tantalum sputtering target

Details Tantalum sputtering target Tantalum sputtering target

2011-02-22

2011-02-22

King, Roy (Department: 1733)

Metal treatment

Stock

Vanadium, niobum, or tantalum base

C204S298120, C204S298130

Reexamination Certificate

active

07892367

ABSTRACT:
A tantalum sputtering target, wherein when the sum of the overall crystalline orientation is 1 on a tantalum target surface, the area ratio of crystals having any orientation among (100), (111), (110) does not exceed 0.5. Thus, obtained is a tantalum sputtering target having superior deposition properties where the deposition speed is high, film evenness (uniformity) is superior, and generation of arcings or particles is reduced.

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