4. Semiconductor device manufacturing: process
  5. Chemical etching
  6. Vapor phase etching

Kouichi Ohto

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Carbon containing silicon oxide film having high ashing...

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum
Reexamination Certificate

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Carbon containing silicon oxide film having high ashing...

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum
Reexamination Certificate

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Process of fabricating semiconductor device having ashing step f

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Patent

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Profile ID: LFUS-PAI-P-1844465

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