4. Adhesive bonding and miscellaneous chemical manufacture
  5. Differential fluid etching apparatus
  6. With microwave gas energizing means

Kevin D. Shipley

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Apparatus and method for cleaning semiconductor wafer

Brushing – scrubbing – and general cleaning – Machines – Wiping
Patent

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Apparatus and method for cleaning semiconductor wafer

Cleaning and liquid contact with solids – Processes – Using solid work treating agents
Patent

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Polishing pad having a wear level indicator and system using the

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent

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Seasoning of a semiconductor wafer polishing pad to polish tungs

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Patent

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Profile ID: LFUS-PAI-P-805647

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