4. Semiconductor device manufacturing: process
  5. Chemical etching
  6. Combined with the removal of material by nonchemical means

Kazuhiko Tokunaga

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Method of etching back layer on substrate

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
Patent

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Method of forming silicon oxide layer

Coating processes – Coating by vapor – gas – or smoke – Mixture of vapors or gases utilized
Reexamination Certificate

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Process for forming gate silicon oxide film for MOS transistors

Fishing – trapping – and vermin destroying
Patent

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Process for forming silicon oxide film and gate oxide film for M

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Patent

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Profile ID: LFUS-PAI-P-35276

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