4. X-ray or gamma ray systems or devices
  5. Specific application
  6. Lithography

Kazuhide Yamashiro

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Process for formation of silicon carbide film

Single-crystal – oriented-crystal – and epitaxy growth processes; – Forming from vapor or gaseous state
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X-ray mask and method of manufacturing an X-ray mask

X-ray or gamma ray systems or devices – Specific application – Lithography
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Profile ID: LFUS-PAI-P-541918

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