Justin L. Kreuzer

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In situ projection optic metrology method and apparatus

Image analysis – Pattern recognition – Template matching
Reexamination Certificate

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Interferometers for measuring changes in optical beam direction

Optics: measuring and testing – By light interference – Having shearing
Reexamination Certificate

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Mask and wafer diffraction grating alignment system wherein the

Optics: measuring and testing – By polarized light examination – With birefringent element
Patent

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Method and apparatus for aligning an opaque mask with an integra

Radiant energy – Means to align or position an object relative to a source or...
Patent

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Method and system for improving focus accuracy in a...

Photocopying – Projection printing and copying cameras – Focus or magnification control
Reexamination Certificate

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Profile ID: LFUS-PAI-P-1412139

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