4. Coating apparatus
  5. Gas or vapor deposition

Julian J. Hsieh

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Apparatus for directional low pressure chemical vapor deposition

Coating apparatus – Gas or vapor deposition
Patent

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Method of controlling FSG deposition rate in an HDP reactor

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate

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Profile ID: LFUS-PAI-P-802863

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