4. Semiconductor device manufacturing: process
  5. Introduction of conductivity modifying dopant into...
  6. Ion implantation of dopant into semiconductor region

Juan Cai

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Characterization of metal particle distributions in a...

Image analysis – Applications
Reexamination Certificate

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Determining oxygen content of metal species in heterogeneous...

Chemistry: analytical and immunological testing – Oxygen containing – Molecular oxygen
Reexamination Certificate

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Hetero-integrated strained silicon n- and p-MOSFETs

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region
Reexamination Certificate

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Hetero-integrated strained silicon n- and p-MOSFETs

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Hetero-integrated strained silicon n- and p-MOSFETs

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

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