4. X-ray or gamma ray systems or devices
  5. Specific application
  6. Lithography

Joseph Pellegrini

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Methods and systems for controlling critical dimension (CD)...

X-ray or gamma ray systems or devices – Specific application – Lithography
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Methods and systems for controlling reticle-induced errors

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
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Methods and systems for estimating reticle bias states

Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
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Profile ID: LFUS-PAI-P-2695899

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