4. Etching a substrate: processes
  5. Masking of a substrate using material resistant to an etchant
  6. Mask is exposed to nonimaging radiation

Joseph C. Langston

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Lithographic technique for patterning a semiconductor device

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
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Multiple reduction photolithography technique

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
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Processes for fabricating device layers with ultrafine features

Etching a substrate: processes – Masking of a substrate using material resistant to an etchant – Mask is exposed to nonimaging radiation
Patent

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Profile ID: LFUS-PAI-P-1543146

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