4. Semiconductor device manufacturing: process
  5. Coating with electrically or thermally conductive material
  6. To form ohmic contact to semiconductive material

Johta Fukuhara

Inventor

Rate now
  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Inventor

active

Apparatus and method of manufacturing semiconductor device

Coating apparatus – Gas or vapor deposition – Crucible or evaporator structure
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Method of manufacturing a semiconductor device

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Patent

  [ 0.00 ] – not rated yet Voters 0   Comments 0

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Johta Fukuhara does not yet have a rating. At this time, there are no reviews or comments for this inventor.

If you have personal experience with Johta Fukuhara, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Johta Fukuhara will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-P-1321559

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.

Canada

 Charities
 Companies
 MP Candidates
 Patents
 Employee Salary Disclosure

World

 Places of the World
 Scientific Papers

United States

 Banks
 Companies
 Counties
 Patents
 Employee Salary Disclosure