4. Chemistry: electrical and wave energy
  5. Apparatus
  6. Coating, forming or etching by sputtering

Joel O'Don Stevenson

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Method and apparatus for monitoring plasma processing operations

Optics: measuring and testing – By dispersed light spectroscopy – With sample excitation
Patent

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Method and apparatus for monitoring plasma processing operations

Optics: measuring and testing – By particle light scattering – With photocell detection
Patent

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Method and apparatus for monitoring plasma processing operations

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent

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Method and apparatus for monitoring plasma processing operations

Coating processes – Measuring – testing – or indicating – Thickness or uniformity of thickness determined
Patent

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Method and apparatus for monitoring plasma processing operations

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent

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Profile ID: LFUS-PAI-P-693053

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