Optics: measuring and testing – By dispersed light spectroscopy – With sample excitation
Patent
1998-04-23
2000-12-05
Kim, Robert H.
Optics: measuring and testing
By dispersed light spectroscopy
With sample excitation
356311, 356 72, 438 9, G01J 330
Patent
active
061574473
ABSTRACT:
The invention generally relates to various aspects of a plasma process, and more specifically the monitoring of such plasma processes. One aspect relates in at least some manner to calibrating or initializing a plasma monitoring assembly. This type of calibration may be used to address wavelength shifts, intensity shifts, or both associated with optical emissions data obtained on a plasma process. A calibration light may be directed at a window through which optical emissions data is being obtained to determine the effect, if any, that the inner surface of the window is having on the optical emissions data being obtained therethrough, the operation of the optical emissions data gathering device, or both. Another aspect relates in at least some manner to various types of evaluations which may be undertaken of a plasma process which was run, and more typically one which is currently being run, within the processing chamber. Plasma health evaluations and process identification through optical emissions analysis are included in this aspect. Yet another aspect associated with the present invention relates in at least some manner to the endpoint of a plasma process (e.g., plasma recipe, plasma clean, conditioning wafer operation) or discrete/discernible portion thereof (e.g., a plasma step of a multiple step plasma recipe). A final aspect associated with the present invention relates to how one or more of the above-noted aspects may be implemented into a semiconductor fabrication facility, such as the distribution of wafers to a wafer production system.
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Smith, Jr. Michael Lane
Stevenson Joel O'Don
Ward Pamela Peardon Denise
Kim Robert H.
Lauchman Layla
Sandia Corporation
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