4. Optical: systems and elements
  5. Having significant infrared or ultraviolet property
  6. Multilayer filter or multilayer reflector

James A. McClay

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Polarization beam splitter for photolithography

Optical: systems and elements – Having significant infrared or ultraviolet property – Multilayer filter or multilayer reflector
Reexamination Certificate

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System and method for reticle protection and transport

Material or article handling – Movable rack having superposed – charge-supporting elements,... – Rack moved vertically by elevating means
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System and method for reticle protection and transport

Material or article handling – Movable rack having superposed – charge-supporting elements,... – Rack moved vertically by elevating means
Reexamination Certificate

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System and method for reticle protection and transport

Material or article handling – Movable rack having superposed – charge-supporting elements,... – Rack moved vertically by elevating means
Reexamination Certificate

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Ultraviolet polarization beam splitter for microlithography

Optical: systems and elements – Having significant infrared or ultraviolet property – Multilayer filter or multilayer reflector
Reexamination Certificate

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Profile ID: LFUS-PAI-P-2536679

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