Material or article handling – Movable rack having superposed – charge-supporting elements,... – Rack moved vertically by elevating means
Reexamination Certificate
2006-01-31
2006-01-31
Lillis, Eileen D. (Department: 3652)
Material or article handling
Movable rack having superposed, charge-supporting elements,...
Rack moved vertically by elevating means
C414S805000
Reexamination Certificate
active
06991416
ABSTRACT:
A substrate protection and transport system and method for transitioning a substrate from atomospheric pressure to vacuum in a lithography tool. The system includes one or more removable substrate transport cassettes. Each cassette has at least one vent and at least one filter. The system further includes an end effector coupled to a robotic arm to enable the substrate to be positioned within one of the cassettes, thereby forming a cassette-substrate arrangement. The system further includes a box having a base and a lid. The box holds one or more of the cassette-substrate arrangements. In this way, a box-cassette-substrate arrangement is provided. An out of vacuum storage rack having shelves for holding the box-cassette-substrate arrangement is also provided. Still further, an entry-exit module having a loadlock is provided for transitioning the cassette-substrate arrangement from atmospheric pressure to vacuum. To transport the substrate, the substrate is first loaded into a removable substrate transport cassette. Next, the cassette-substrate arrangement is loaded into the box. The box-cassette-substrate arrangement is then transported to a shelf of an out of vacuum storage rack. During further processing, the cassette-substrate arrangement is unloaded from the box-cassette-substrate arrangement. The cassette-substrate arrangement is then loaded into a loadlock where it can be transitioned from atmospheric pressure to vacuum. During transitioning, the filters and vents restrict particles within the loadlock from entering the cassette-substrate arrangement and reaching a surface of the substrate.
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Yoshitake, S. et al. “New Mask Blank Handling System for the Advanced Electron Beam Writer,” 19thAnnual BACUS Symposium on Photomask Technology,. Monterey, California, Sep. 1999., SPIE, vol. 3873, pp. 905-915.
del Puerto Santiago E.
DeMarco Michael A.
Friedman Glenn M.
Ivaldi Jorge S.
McClay James A.
ASML Holding N.V.
Fox Charles A.
Lillis Eileen D.
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