Material or article handling – Movable rack having superposed – charge-supporting elements,... – Rack moved vertically by elevating means
Reexamination Certificate
2007-07-31
2007-07-31
Fox, Charles A. (Department: 3652)
Material or article handling
Movable rack having superposed, charge-supporting elements,...
Rack moved vertically by elevating means
C414S805000, C414S940000
Reexamination Certificate
active
11282474
ABSTRACT:
A substrate protection and transport system and method for transitioning a substrate from atmospheric pressure to vacuum in a lithography tool. The system includes one or more removable substrate transport cassettes that support a substrate. The cassette can include a base portion and top portion, and can include a seal. Each cassette has at least one vent and at least one filter. The system further includes a box having a base and lid. The box holds one or more cassette-substrate arrangements. A storage rack having shelves for holding the box-cassette-substrate arrangement is also provided. Further, an entry-exit module having a loadlock is provided for transitioning the cassette-substrate arrangement from atmospheric pressure to vacuum. The entry-exit module can include a shuttle and/or elevator for transporting the cassette-substrate arrangement. During transitioning, the filter(s) and vent(s) restrict particles within the loadlock from entering the cassette-substrate arrangement and reaching a surface of the substrate.
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Yoshitake, S. et al., “New Mask Blank Handling System for the Advanced Electron Beam Writer,” 19thAnnual BACUS Symposium on Photomask Technology, Monterey, California, Sep. 1999, SPIE, vol. 3873, pp. 905-915.
del Puerto Santiago E.
DeMarco Michael A.
Friedman Glenn M.
Ivaldi Jorge S.
McClay James A.
ASML Holding N.V.
Fox Charles A.
Sterne Kessler Goldstein & Fox PLLC
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