4. Chemistry: electrical and wave energy
  5. Apparatus
  6. Coating, forming or etching by sputtering

Jai-Kwang Shin

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Electron cyclotron resonance equipment with variable flare...

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
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Elementary plasma source and plasma generation apparatus...

Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating
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Sputtering apparatus for forming a metal film using a...

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
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Profile ID: LFUS-PAI-P-2736400

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