4. Semiconductor device manufacturing: process
  5. Coating of substrate containing semiconductor region or of...
  6. Multiple layers

Jae-gak Kim

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Inductively coupled plasma chemical vapor deposition apparatus

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Inductively coupled plasma chemical vapor deposition technology

Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Multiple layers
Patent

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Thin film formed by inductively coupled plasma

Active solid-state devices (e.g. – transistors – solid-state diode – With means to control surface effects – Insulating coating
Reexamination Certificate

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Profile ID: LFUS-PAI-P-1401489

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