4. Chemistry: electrical and wave energy
  5. Apparatus
  6. Coating, forming or etching by sputtering

Jack A. Dimock

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Gate valve with magnetic closure for use with vacuum equipment

Valves and valve actuation – With means to increase head and seat contact pressure – With positive reduction
Patent

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Wafer processing machine

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent

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Wafer processing machine

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent

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Wafer processing machine with evacuated wafer transporting and s

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent

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Profile ID: LFUS-PAI-P-673808

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