4. Semiconductor device manufacturing: process
  5. Coating with electrically or thermally conductive material
  6. To form ohmic contact to semiconductive material

Hyungsuk Alexander Yoon

Inventor

Rate now
  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

Inventor

active

Apparatus and method for integrated surface treatment and...

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Apparatus for the removal of a metal oxide from a substrate...

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – Having glow discharge electrode gas energizing means
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

CVD TiSiN barrier for copper integration

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

CVD TiSiN barrier for copper integration

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Deposition of tungsten films from W(CO)6

Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate

  [ 0.00 ] – not rated yet Voters 0   Comments 0

No associations

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Hyungsuk Alexander Yoon does not yet have a rating. At this time, there are no reviews or comments for this inventor.

If you have personal experience with Hyungsuk Alexander Yoon, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Hyungsuk Alexander Yoon will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-P-2098079

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.

Canada

 Charities
 Companies
 MP Candidates
 Patents
 Employee Salary Disclosure

World

 Places of the World
 Scientific Papers

United States

 Banks
 Companies
 Counties
 Patents
 Employee Salary Disclosure