Method and apparatus for automatic purge of HMDS vapor piping

Details Method and apparatus for automatic purge of HMDS vapor piping Method and apparatus for automatic purge of HMDS vapor piping

1997-12-22

2000-02-01

Bueker, Richard

Coating apparatus

Gas or vapor deposition

C23C 1600

Patent

active

060198494

ABSTRACT:
A number of air actuated valves are added to a conventional apparatus for treating semiconductor wafers with HMDS, hexamethyl-disilazane, vapor to improve the adhesion between the wafers and resist layers. These valves allow for automatic purging of the HMDS vapor from the pipes in the apparatus by dry nitrogen thereby preventing HMDS vapor condensation in the pipes which leads to contamination of the HMDS supply. The valve system prevents any backstreaming of nitrogen gas into the HMDS supply tank.

REFERENCES:
patent: 5123375 (1992-06-01), Hansen
patent: 5401316 (1995-03-01), Shiraishi et al.
patent: 5501870 (1996-03-01), Shiraishi et al.
patent: 5505781 (1996-04-01), Omori et al.

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