Hirotomo Inui

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Method for analyzing light intensity distribution

Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate

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Method of estimating shape of chemically amplified resist

Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Chemical analysis
Reexamination Certificate

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Parametric analyzing method for calculating light intensity

Data processing: generic control systems or specific application – Specific application – apparatus or process – Product assembly or manufacturing
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Post exposure bake simulation method

Patent

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Profile ID: LFUS-PAI-P-1032525

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